| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_cf213be03285a0b93967ae2fd2fd351a |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31133 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-162
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-168
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31133
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-09
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-327
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-42
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0273
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-16 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-42
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-09 |
| filingDate |
2014-01-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2018-01-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5472f15aeda45041f827fcec236b912f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_24d8f1ebaeee530e4330bb68ab90f815
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_672f02ea3604879642aedb392ee74533
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_02626124cd831c44ddd70ff0827bc83e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_13cb30258c14ee4d75edda0aab8b85fc
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2c851d28f2a64241929e5b87299e9de1 |
| publicationDate |
2018-01-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-I610138-B |
| titleOfInvention |
Diluent composition and its use |
| abstract |
The invention relates to a diluent composition and use thereof. The diluent composition of the present invention has excellent dissolving power for various photoresists, and has the most suitable volatility, so it can effectively remove unnecessary in a short time in the edge ball removal process or similar procedures. The attached photoresist can be applied to the pre-wetting process of the semiconductor substrate, so that a photosensitive film with a small amount of photoresist can be effectively formed. |
| priorityDate |
2013-02-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |