| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_a665d61597c2731ab4130971ee397dc9 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24B37-044
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3212
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1436 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304 |
| filingDate |
2013-09-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2018-01-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7ac4a6179aefdc933f6088105a66f464
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9c7df139bb8b8a4400ab8cda5a63fb4a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c3672b16be9e01dfcbc6e20dbb5a76f5 |
| publicationDate |
2018-01-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-I609949-B |
| titleOfInvention |
Honing composition |
| abstract |
The present invention provides a polishing composition suitable for polishing an object to be polished having a metal wiring layer and reducing step defects while maintaining a high polishing rate.nn n n The polishing composition of the present invention is a polishing composition used for polishing an object to be polished having a metal wiring layer, and contains a compound that generates inorganic phosphate ions and water, and the aforementioned inorganic phosphate ions in the polishing composition. The content is 10 mass ppm or less. |
| priorityDate |
2012-09-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |