Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0035 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
filingDate |
2011-03-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate |
2017-03-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9673671fa8fa66b5b418ee1fd161fc3e http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0af87f7f14f76735a6cd8f4c4a79a267 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0f755c300b2571521cc9151a64d85c60 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d2a6564d37d593cb43a9d727ba2ef3bf http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8e04511b6ef753a717725f9debdfc548 |
publicationDate |
2017-03-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
TW-I575309-B |
titleOfInvention |
Method for forming photoresist pattern and photoresist composition |
priorityDate |
2010-03-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |