Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fcc0b66123940d1b32783569ebfa2d45 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-095 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
filingDate |
2007-11-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate |
2016-06-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4d9feb8c121346e11a4e5c43fdc00588 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5f1122c5a9aa7057aad92e677c0c3382 |
publicationDate |
2016-06-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
TW-I539238-B |
titleOfInvention |
Photoresist underlayer film forming composition and pattern forming method |
priorityDate |
2006-11-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |