| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fcc0b66123940d1b32783569ebfa2d45 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G8-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0273
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G8-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F238-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-094
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G8-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-091
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L61-06 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-09 |
| filingDate |
2012-03-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2016-05-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e60d887388d0c83cc7b802ce039dd8ce
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cfcbea7b62c2c8449da55d2cca7dd61c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_828e44f905150668e0a8e8ce1165781b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_91aad426677c44749791cd82922b40c0
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bb2cdfdb7a2bcaed73932a50e34f222e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_be9de5fc73a4adfbda4cc358da8f2cb2
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_82fe0c1e9e13e30f2c03cf05c2975386
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a266b22aa8bfef86c6446fd65fed4af5 |
| publicationDate |
2016-05-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-I531863-B |
| titleOfInvention |
Composition of photoresist underlayer film formation and pattern forming method |
| priorityDate |
2011-03-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |