| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_b7886f9841c03e2449d28f454ebbe1dc |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D11-0047
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02074
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D1-62
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D7-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D7-3218
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D3-43
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D3-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D7-3209
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D3-26 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D11-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D1-62
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D7-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D3-30 |
| filingDate |
2006-05-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2015-11-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ff6c7bacc07eab4cac92aa54f91cd8c3
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a3d91e00e9a811465af889d2c91aad5d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_25ddb2110235926cd7292ef07e48a0c1
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cb9b49f34b9a3df554bf1a76dba1323f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a1f48afa15522e4a50d7868cb7d6e7c9
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d3989dc9750463ee8001672175c6d719 |
| publicationDate |
2015-11-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-I507521-B |
| titleOfInvention |
Chemical mechanical polishing polishing composition after copper passivation and method for using the same |
| priorityDate |
2005-05-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |