| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_bce787970b69aeb08d159e7c101c9ed7 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02B5-208
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02B5-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67115
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3105 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-30 |
| filingDate |
2011-11-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2014-09-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_dcd79d955774624a15dd5459e5de68aa
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5ac58e064a66929d86ffde79680662ad
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c60fff14ef82dcc2e61b15e594b76db8 |
| publicationDate |
2014-09-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-I451486-B |
| titleOfInvention |
Method and apparatus for adjusting wafer processing profile in a UV chamber |
| priorityDate |
2010-11-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |