| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_090b32b53b36d3ea2696c4a94c371112 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C69-54
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-032 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-031
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C211-22 |
| filingDate |
2011-01-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2014-01-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_74412adad2f87fd503b80f5f7220470e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7367a2fc6018fe76cd11f389936572ab
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6487c88c895152ef4180efae83d6e193 |
| publicationDate |
2014-01-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-I424269-B |
| titleOfInvention |
Hydrophilic monomer, hydrophilic photoresist composition containing the same, and method for forming photoresist pattern |
| priorityDate |
2011-01-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |