http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I411606-B
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d9705e72caa2c6990430c3e4cf53c25e |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D209-86 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D209-82 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-031 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F2-50 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F2-50 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L101-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D209-86 |
| filingDate | 2010-02-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2013-10-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d1db6bd21cc66497d091f6d44d46810f http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_83bbe21420e0ec16d07bf3992fe102fc http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d065bf1bcb57d269f5a94f38b697e635 |
| publicationDate | 2013-10-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-I411606-B |
| titleOfInvention | An oxime ester compound, a radical polymerization initiator, a polymerizable composition, a negative resist, and an image pattern |
| abstract | Disclosed are a novel oxime ester compound, which is capable of functioning as a highly sensitive radical polymerization initiator, and a curable composition using the same. Also disclosed are a negative resist material, which is appropriately usable particularly as a photoresist material, and an image pattern-forming method using said negative resist. A radical polymerization initiator (A) is represented by general formula (1). In general formula (1), R1 and R2 are selected from an alkyl group, an aryl group, a heterocyclic group, etc.; R3 to R5 are selected from a hydrogen atom, an alkyl group, etc.; R6 to R9 are selected from a hydrogen atom, an alkyl group, an aryl group, a heterocyclic group, etc.; and R10 to R14 are selected from a hydrogen atom, a cyano group, a nitro group, a haloalkyl group, a sulfinyl group, a sulfonyl group, an acyl group, etc., provided that all of R10 to R14 are not hydrogen atoms at the same time. |
| priorityDate | 2009-06-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 723.