http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I409588-B
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_15bd6a1febacd9542fb1af4a1d3a32e2 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F222-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-028 |
| filingDate | 2010-09-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2013-09-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0a2ebedae033ae83e8a39b4888a80383 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7a72f2f31039a776449f02885915d364 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f698b353735d921ea891ef4ae2e4db2b |
| publicationDate | 2013-09-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-I409588-B |
| titleOfInvention | Photosensitive resin composition |
| abstract | A photo-sensitivity resin composition is provided. The photo-sensitivity resin composition includes (A) polymer having three or more blocks, where the blocks are polymerized by following monomers: (a1) 0.1% to 10% of ethylenically unsaturated monomer of phosphoric acid having an unsaturated reactive group at one side or two sides, (a2) ethylenically unsaturated monomer containing acid group and (a3) ethylenically unsaturated monomer except (a1) and (a2); (B) compound having at least one ethylenically unsaturated double bond; (C) organic acid anhydride; (D) photopolymerization initiator; and (E) organic solvent. |
| priorityDate | 2010-09-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 136.