http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I409349-B

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filingDate 2004-06-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2013-09-21-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f276d519ba89eed523a468701f069b6c
publicationDate 2013-09-21-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber TW-I409349-B
titleOfInvention Manufacturing device
abstract The present invention provides a vapor deposition method and a vapor deposition apparatus as one of manufacturing apparatus that promotes an efficiency of utilizing an EL material to reduce a manufacturing cost and is excellent in uniformity or throughput of forming an EL layer. In a deposition chamber, according to the present invention, an evaporation source holder to which a container encapsulating an evaporation material is set is moved (or shuttled) at a constant speed only in one direction (Z direction) with respect to the substrate. The substrate is transported in a direction (X direction) orthogonal to the movement direction of the evaporation source holder (Z direction) at regular intervals.
priorityDate 2003-06-27-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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