http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I408519-B
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e4c608a8531ea588aab7e23318e09a77 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D3-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-42 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D3-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D3-34 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D3-30 |
| filingDate | 2007-10-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2013-09-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_53af2eb49c29cfeb66450fa31ad3f40f http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_891fc2c98638ea1bad069b120cad22f6 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a4acfcecabcda8f43bd922246332b27f http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9f1575ce59e10aa52881a0d7af5d3195 |
| publicationDate | 2013-09-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-I408519-B |
| titleOfInvention | Thick film photoresist cleaner |
| abstract | The invention discloses a stripper for thick photoresists, comprising: dimethyl sulfoxide, potassium hydroxide, benzyl alcohol and/or the derivatives thereof, quaternary ammonium hydroxide, and alkanolamine. The stripper for thick photoresists of the invention can be used for removing thick photoresists on metal, compound metals, or dielectric material, and at the same time, the stripper exhibits low etching rate for SiO2, copper, low-k material, and so on. Therefore, the stripper of the invention has good future for appicatoin in the microelectronics fields such as semiconductor wafer cleaning. |
| priorityDate | 2007-10-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 153.