http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I408501-B
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_0606c8e113c860d8a6c41e2aaaf3120d |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-24802 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K2323-06 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08K5-42 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0236 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0007 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08K5-235 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L29-786 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-022 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02F1-1368 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G8-10 |
| filingDate | 2010-06-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2013-09-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_065fc3f2008ded8e963166a0a87a9659 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a5b78e7f686d2090034a7bf4fe91afc1 |
| publicationDate | 2013-09-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-I408501-B |
| titleOfInvention | A positive-type photosensitive resin composition, and a method of forming a pattern using the composition |
| abstract | The present invention relates to a positive photosensitive resin composition and a method for forming a pattern using said composition by the slit coating process, and more particularly, to a positive photosensitive resin composition, which exhibiting excellent coating uniformity, high sensitivity, excellent developing properties and high film residual ratio and a method for forming a pattern using said composition by the slit coating process. The said composition comprises a novolac resin (A), an o-naphthaquinone diazide sulfonic acid ester (B) and a solvent (C). Wherein the novolac resin (A) has a cumulative weight percentage of from 5% to 45% with molecular weight of from 1,000 to 3,000 and the novolac resin (A) of the present invention also has a cumulative weight percentage of less than 10% with molecular weight of more than 30,000, both of which can be calculated by integral molecular weight distribution curve obtained by plotting the cumulative weight percentage versus molecular weight falling within a range between 200 and 120,000 determined by gel permeation chromatography. |
| priorityDate | 2010-06-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 307.