http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I408500-B
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_444d3641747bb086afc4ad00c49f770b http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_8e43b4ca6b41ce9f54c9a895d474c81a |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C381-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G59-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 |
| filingDate | 2007-07-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2013-09-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4e50ad2adae97f728acffff055f06a0f http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2bbc8a23885c156c33fefad08aab871a |
| publicationDate | 2013-09-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-I408500-B |
| titleOfInvention | Photosensitive resin composition, laminate thereof, cured product thereof, and formation method of pattern using the composition (1) |
| abstract | <P>PROBLEM TO BE SOLVED: To provide a high-sensitive photosensitive resin composition, with which a pattern of high-resolution and high aspect ratio can be formed. <P>SOLUTION: The photosensitive resin composition contains a polyfunctional epoxy resin (A) in a specified structure; and a cationic photopolymerization initiator (B) that is sulfonium-tris(pentafluoroethyl) trifluorophosphate. <P>COPYRIGHT: (C)2008,JPO&INPIT |
| priorityDate | 2006-07-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 150.