| abstract |
A photocurable composition is provided to have excellent properties such as photocurability, adhesion, demoldability, pattern profiles, coating uniformity, and etching appropriateness. A photocurable composition includes (a) a polymerizable compound, (b) 0.1-15% by mass of a photopolymerization initiator and/or a photoacid generator, and (c) 0.001-5% by mass of at least one selected from fluorine-based surfactants, silicon-based surfactants, and fluorine-silicon-based surfactants, and has a viscosity of 3-18 mPa.s at 25 °C. The polymerizable compound(a) contains (e) a polymerizable unsaturated monomer having a primary irritation index of 4.0 or less and (f) a polymerizable unsaturated monomer having a viscosity of 30 mPa.s or less at 25 °C, wherein the respective monomers are contained in amounts of 50% by mass or more. |