http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I408042-B
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e7962109cd4763907b82b66760cd0ae8 |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29C2059-023 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29C2035-0827 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29K2083-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29C35-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29K2105-243 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29C33-3878 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29C59-022 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29C71-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29C35-0805 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B29C33-38 |
| filingDate | 2011-06-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2013-09-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a11fe1504753dfe2b44facfc8066578e http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b7ec41ab3633c5aa18feba5a158db961 |
| publicationDate | 2013-09-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-I408042-B |
| titleOfInvention | Production method of copy mold for embossing |
| abstract | The present invention provides a method for producing a replica mold for imprinting use which is inexpensive and has good properties including strength and flexibility. The method for producing a replica mold according to the present invention comprises the steps of: (A) coating a substrate with an organic-inorganic hybrid material; (B) semi-curing the coated surface with heat and/or an electromagnetic ray to produce a substrate for fine raised and depressed pattern formation; (C) pressing a master mold having a predetermined fine raised and depressed pattern formed thereon against the substrate for fine raised and depressed pattern formation by an imprinting method to transfer the fine raised and depressed pattern onto the substrate; and (D) irradiating the substrate for fine raised and depressed pattern formation onto which the fine raised and depressed pattern is transferred with an electromagnetic ray to cure the substrate. |
| priorityDate | 2010-06-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 208.