| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_716e9a2606ffd4ba1a2a3917e4a402fd
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fc29036b67a4fda397921268d930de86 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B81B2201-0264
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B81B2207-015
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B81C2201-0132 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02B1-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-306
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B81C1-00531
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76898 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-302 |
| filingDate |
2009-08-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2013-08-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a3edc12c51bf0058b6974115c9a64e27
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_56f77507cb625280b531c745007d751d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bae700a5c30043df63068ec2cbd22d28
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9df241fb3da3d701cd48de93faa06d27
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_99024ed0d41252b924f969f87c1d4bc7
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6e5e91fd38fabb49d6db83881a873157
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2178bd9ecdb29aee625024cef0b9de3c |
| publicationDate |
2013-08-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-I406329-B |
| titleOfInvention |
Cluster jet processing method, semiconductor component, microelectromechanical component and optical component |
| abstract |
A method for processing a sample using an electrically neutral reactive cluster is provided. The surface of a sample is processed by jetting out a mixed gas that is composed of a reactive gas and a gas with a boiling point lower than that of the reactive gas from a gas jetting part of a vacuum process room in which the sample is placed by a pressure in a range in which the mixed gas is not liquefied, in a predetermined direction, while adiabatically-expanding the mixed gas, thereby generating a reactive cluster and jetting the reactive cluster against the sample in the vacuum process room. |
| priorityDate |
2008-08-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |