http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I405875-B
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_6fc8bbba7dbfdc1fe42f350fc84e17a3 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23F1-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23F1-20 |
| filingDate | 2007-01-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2013-08-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8a9150bf6fae9d0f93983e6dd7eeda04 |
| publicationDate | 2013-08-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-I405875-B |
| titleOfInvention | Etching liquid composition of titanium and aluminum metal laminated film |
| abstract | The present invention aims to provide etchant compositions for metal laminated films on an insulating film substrate such as glass, a silicon substrate, or a semiconductor substrate, which includes a layer consisting of titanium or titanium alloy, and a layer consisting of aluminum or aluminum alloy formed films by sputtering method, wherein said etchants do not damage substrates under the metal laminated films, forming taper angles of between 30 and 90 degrees and etching in a lump metal laminated films. This aim is achieved by the present etchant compositions comprising at least one fluorine compound selected from the group consisting of metal salts of ammonium salts of hydrofluoric acid, hexafluorosilicic acid, metal salts or ammonium salts of hydrofluoric acid, tetrafluoroboric acid and metal salts of ammonium salts of tetrafluoric acid, and oxidizing agent. |
| priorityDate | 2006-08-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 109.