http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I405053-B
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_33c922e05f6133b7d72dbb849d77487d |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-42 |
| filingDate | 2009-11-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2013-08-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fd34a64191243d0cd6571f1de99a5077 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_050b84f670da663ae481426aadf7b269 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_140f729cc8d99b6b02eda3913f33845c |
| publicationDate | 2013-08-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-I405053-B |
| titleOfInvention | Photoresist stripping composition and method for stripping photoresist |
| abstract | The present invention relates to a photoresist stripper composition. More particularly, the photoresist stripper composition according to the present invention has excellent photoresist stripping ability and excellent corrosion prevention effect in respects to a lower film of photoresist in the case of when molybdenum (Mo) is comprised in the lower film of photoresist by comprising a compound that is represented by Formula 1. |
| priorityDate | 2009-11-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 92.