| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_bce787970b69aeb08d159e7c101c9ed7 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-205
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02164
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02274
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4405
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4404
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31612
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-045 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-31 |
| filingDate |
2008-09-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2013-06-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0b2484a694eeb97a64adee873f12da40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5f7959da77e6e658566b7092ef574ec3
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_368e7856514be4430d2901ae67e700a9
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_11cdfc8f017c8e4db0c41671cf4e030c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fb0e98595b373e2892a50057ccfe60ac
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d00508927b2b4c71dea8efef775b4cc1 |
| publicationDate |
2013-06-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-I397960-B |
| titleOfInvention |
Method for reducing etch rate drift in high density plasma processes |
| priorityDate |
2007-09-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |