| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_aafe0172ffd94d3486c518b0709bb2b3 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-091
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0276 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate |
2007-12-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2012-12-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7fb99758c98ee8b0a4f908e5d08022e4
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c1d8437a12a5c31790722da5174933c2
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_97bfb8a879949b6e6004edb6c7022d0e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_937bd08ed499d33662831a268f5967a1
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_69450853bcb776b620d41bdea10319b3
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4445ca5d86e19df7d61dce3199573d81 |
| publicationDate |
2012-12-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-I380129-B |
| titleOfInvention |
High etch resistant hardmask composition having antireflective properties, method for forming patterned material layer using the hardmask composition and semiconductor integrated circuit device produced using the method |
| priorityDate |
2006-12-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |