http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I335777-B
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_16d7f610531dbae77bcb2e95d91a071b |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G21K1-062 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05G2-003 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82Y10-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05G2-005 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05G2-00 |
| filingDate | 2006-06-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2011-01-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_02bd7641e1d934c4f3ccbb2805552f91 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d1ac36b737ea1e077ba2d9284303f98e http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ff773e2bda15895815cac47aa44e0dbd http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_30db71555952285942cf2cae187503c6 |
| publicationDate | 2011-01-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-I335777-B |
| titleOfInvention | Alternative fuels for euv light source |
| abstract | An EUV light source collector erosion mitigation method and apparatus for a collector comprising a multilayered mirror collector comprising a collector outer surface composed of a capping material subject to removal due to a removing interaction with materials created in an EUV light-creating plasma, is disclosed which may comprise including within an EUV plasma source material a replacement material. The replacement material may comprise the same material as the capping material of the multilayered mirror. The replacement material may comprise a material that is essentially transparent to light in a selected band of EUV light, e.g., a spectrum of EUV light generated in a plasma of a plasma source material. The replacement material may comprise a material not susceptible to being etched by an etching material used to remove deposited plasma source material from the collector, e.g., a halogen etchant. |
| priorityDate | 2005-06-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 40.