| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_461514df460e0cdd5644e86ba60adbf7 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate |
2006-04-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2010-12-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_033d7187e8eee207a81faa10c8960aad
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_14e7a12e3156ebb3694e4ddf690f2368
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c0b4623fcb7da934cb8644ba3b257701
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_35a9bc8631ba919571ff8e5aafa97744
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0c13c8fc940b2b8e3d9ae1ebb67336d4 |
| publicationDate |
2010-12-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-I334059-B |
| titleOfInvention |
Positive and negative dual function magnetic resist lithography |
| priorityDate |
2006-04-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |