| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_dc05229904be2987713acc8b41db7cd3 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-115 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0007
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02F1-13
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate |
2003-06-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2009-05-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_da7532a057796447bae78b2494f12efa
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_16d163820a726fb45a12e8022a636495
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6aa1c9f1f607a70d59b17b3039959fb8
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1c5c355284fc2a4ec75efb2e839b317d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f820cf2e3fb1e83e530c624758ab52df |
| publicationDate |
2009-05-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-I309337-B |
| titleOfInvention |
Photoresist composition for deep ultraviolet lithography comprising a mixture of photoactive compounds |
| priorityDate |
2002-06-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |