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filingDate 2003-06-06-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2007-12-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_83d100a498dcb9cf0c92a648e09f175b
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publicationDate 2007-12-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber TW-I290482-B
titleOfInvention Method for cleaning exhausted gas
abstract The object of the invention is to provide a method for cleaning an exhausted gas, the method of which has the capability of easily cleaning an exhausted gas, such as the gas exhausted from a device for manufacturing semiconductor containing nitrogen oxides and/or organic solvents in high concentration and having high fluctuation in concentration, into a clean gas without using a large cleaning device or a cleaning device having complex constructions under a lower temperature and in higher decomposing ratio. The invention provides a method comprising contacting an exhausted gas containing nitrogen oxides and/or organic solvents with a cleaning reagent having a metal and a metal oxide as an effective component, or a cleaning reagent having a lower-order metal and a higher-order metal oxide as an effective component under heating in order to conduct a reduction of nitrogen oxides and/or an oxidation decomposition of organic solvents, in the mean while substantially detects the increase-reduction amount or deviation of the cleaning reagent inducing from the redox reaction and supply gas at the time of components' ratio of the cleaning reagent departing from the pre-designated range of administration so as to restore the components' ratio of the cleaning reagent while cleaning the exhausted gas.
priorityDate 2002-06-07-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 45.