Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_88fc7f9eb617072238851d46591a0c76 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24D3-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304 |
filingDate |
2005-01-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate |
2007-11-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6b29c963f1a2d599f91d329f30d912db http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c99e82926c1bc132cba0b602b80c28d1 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e380e2163bd8a6bf35cb9cc91cbdf3aa http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_12f7d0c8937ab88a12eacecf39200057 |
publicationDate |
2007-11-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
TW-I289089-B |
titleOfInvention |
Method for improving HSS CMP performance |
abstract |
Disclosed is a method for improving HSS CMP performance. After performing a HSS CMP process for a predetermined time, DI water is introduced and the polishing process is continued, so that the CMP rate and performance can be improved. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I565557-B |
priorityDate |
2005-01-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |