http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I287173-B
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-022 |
| filingDate | 2004-05-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2007-09-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4b5747e5b58e46cb2191e550b48bd427 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b800b46f1ca77d85db8efe078b92b37b http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_574f38ab2679b5cfa0febb692cc5b5af |
| publicationDate | 2007-09-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-I287173-B |
| titleOfInvention | Positive photoresist composition for manufacturing substrate and method for forming resist pattern |
| abstract | A positive photoresist composition for a system LCD of low cost, which has a high linearity, a high image dissector, a high DOS property, a high inhibition of degassing and a high heating resistance, and more desirably can endure through volume consumption, and a method for forming the resist pattern using the positive photoresist composition are provided. The positive photoresist composition is for a system LCD and contains (A) an alkali soluble resin component or (A') an alkali insoluble resin component or a resin component which is not readily soluble in alkali, wherein the (A') resin component is altered to become alkali soluble due to acid action. The resin components are obtained by purification action of an ion exchange resin before use in the control of the resist composition. |
| priorityDate | 2003-06-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 223.