| abstract |
The present invention provides a dresser for polishing cloth, and a manufacturing method thereof for maintaining a stable dressing property of the dresser for the polishing cloth, creating a constant polishing face on the surface of the polishing cloth, and eliminating scratches of a wafer due to the polishing cloth, especially caused by grains. In this dresser for polishing cloth, a dressing part is formed on the surface of a metal base 1. The dressing part is formed of a large number of abrasives 2, and a planar holding material 3 holding the abrasives. The holding material 3 is composed of any one kind of cemented carbide, cermet, and ceramics. Also, silicon dioxide may be added to the holding material 3 containing silicon. In this method for manufacturing the dresser for the polishing cloth, an adhesive part with approximately abrasive diameter size is installed to a holding material surface and a sheet put on the surface corresponding to the holding position of each of the abrasives 2 regularly arranged. After the respective abrasives 2 are adhered on the adhesive part, the holding material is sintered to fix the abrasives. |