http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I286664-B
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_24aca9ded2638ea793d05360dde7a4a0 |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-122 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-106 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-115 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0395 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C381-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D333-46 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C381-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D333-46 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
| filingDate | 2001-06-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2007-09-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a9b0528a8ae6ad84bf0d1255548c1110 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b4c7b7d9db3c63212a6a592843c869bb http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_36616a7dfdb0a7e59c6f4b808e61f918 |
| publicationDate | 2007-09-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-I286664-B |
| titleOfInvention | Chemical amplification type positive resist composition and sulfonium salt |
| abstract | A chemical amplifying type positive resist composition which provides a resist pattern having an exceedingly improved line edge roughness, and is excellent in various resist performances such as dry etching resistance, sensitivity and resolution; and comprises: (A) an acid generator containing (a) a sulfonium salt represented by the following formula (I), wherein Q1 and Q2 is alkyl or a cycloalkyl, or Q1 and Q2 form, together with a sulfur atom to which Q1 and Q2 are adjacent, a heteroalicyclic group; Q3 represents a hydrogen atom, Q4 represents alkyl or a cycloalkyl, or Q3 and Q4 form, together with a CHC(O) group to which Q3 and Q4 are adjacent, a 2-oxocycloalkyl group; and Q5SO3- represents an organosulfonate ion, and (b) at least one onium salt selected from a triphenylsulfonium salt represented by the following formula (IIa), and a diphenyliodonium salt represented by the following formula (IIb), wherein P1 to P5 represent hydrogen, a hydroxyl group, alkyl, or alkoxy; and P6SO3- and P7SO3- each independently represent an organosulfonate ion; and (B) a resin which has a polymerization unit having a group instable against an acid, and is alkali-insoluble or -slightly soluble itself, but is converted to alkali-soluble by the action of an acid. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I491600-B |
| priorityDate | 2000-06-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 272.