| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_44ff3005508304394801e265e503b811 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2063
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02F1-1306
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-38
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02F1-1303
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0274
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0337 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-70
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-336
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-54
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02F1-133
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02F1-13
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02F1-1368
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L29-786 |
| filingDate |
2004-06-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2007-09-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_04ceeb6fcbd9f3a04043cd2ccf477ea4
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cb327545f4b661dbb26091e731839d63 |
| publicationDate |
2007-09-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-I286663-B |
| titleOfInvention |
Method for manufacturing gray tone mask, and gray tone mask |
| abstract |
An object of the present invention is to provide a method for manufacturing a gray tone mask in halftone film type being capable of manufacturing TFT in high quality. The present invention relates to a method for manufacturing gray tone mask having a light-shielding part, a transparent part, and a translucent part, comprising the steps of preparing a mask blank having a translucent film (22) and a light-shielding film (23) sequentially formed on a transparent substrate (21), forming a resist pattern (24a) of an area corresponding to the light-shielding part onto the mask blank and forming a light-shielding part onto the translucent film (22) by etching light-shielding film (23) with said resist pattern (24a) as a mask, and forming resist pattern (24b) onto an area at least comprising the translucent part, and subsequently forming the translucent part and transparent part by etching translucent film (22) with the said resist pattern (24b) as a mask. |
| priorityDate |
2003-06-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |