http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I284354-B
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d80f1040809503e54509c871ba828f75 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-3021 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-00 |
| filingDate | 2005-12-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2007-07-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_99ff0f1b76f77a6932e8ab6061a646b4 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c675877f14a83fc78ab8b77b195ead0d http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_094025ff09e174992affc7a2b0b08e6a |
| publicationDate | 2007-07-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-I284354-B |
| titleOfInvention | Developing processing method and developing processing apparatus |
| abstract | The developing solution supply nozzle 33 is moved from an end position to other end position on the wafer W, while dispensing a developing solution and a developing solution is supplied on the wafer W and stillness development is carried out. Then, while rotating the wafer W, a rinse liquid is supplied to the wafer W by the rinse liquid supply nozzle 50, and development is stopped. Then, the liquid containing a polar fluoridation carbon system compound is supplied to the wafer W by the liquid supply nozzle 63, high-speed rotation of the wafer is carried out, and it dries. |
| priorityDate | 2004-12-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 47.