| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G77-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L83-06 |
| classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G77-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L83-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-02 |
| filingDate |
2003-12-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2007-06-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2f4d739b2182710142839d979ae1b4d2
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1d7553b249b3632974346bc3d101edca
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d3fd1bdd5334a22064e14dba6000ffb6
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_13814e23073e22d9eecdc7fb7d640788
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d8a2ce879775672aa45012a566765add |
| publicationDate |
2007-06-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-I282040-B |
| titleOfInvention |
Silicone-based chemical-amplification positive-working photoresist composition |
| abstract |
A silicone-based chemical-amplification positive-working photoresist composition that can be produced from easily procurable compounds as raw materials through simple means and can provide a bilayer resist material from which fine pattern of high resolution, high aspect ratio, desirable sectional morphology and low line edge roughness can be formed. In particular, a chemical amplification type positive resist composition comprises alkali soluble resin (A) and photoacid generator (B), in which a ladder type silicone copolymer comprising (hydroxyphenylalkyl)silsesquioxane units (a1), (alkoxyphenylalkyl)silsesquioxane units (a2) and alkyl- or phenylsilsesquioxane units (a3) is used as the alkali soluble resin (A). The copolymer, in which, in the component (A), the units (a3) are phenylsilsesquioxane units, is a novel compound. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I746671-B |
| priorityDate |
2002-12-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |