http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I278619-B

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assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_442006254efb98c9cebec6ee5a08d5e8
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N27-00
filingDate 2004-12-24-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2007-04-11-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2aac2d9500ffcb7358f5a4b67293706a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f7fb1ac646f1c43c320ab4fdd789e394
publicationDate 2007-04-11-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber TW-I278619-B
titleOfInvention Gas sensor and the method of producing thereof
abstract This invention provides a gas sensor, which comprises a substrate having a first surface and a second surface opposite to the first surface, a resistor structure formed in the second surface of the substrate and made of a semiconductor material with a plurality of carriers, at least two of contact electrodes connected with the resistor structure, and a sensor layer covered the resistor structure and produced by sol-gel process. This invention also provides a method for producing the gas sensor stated above, which comprises the steps of (a) providing a substrate, (b) providing a resistor structure in the substrate and made of a semiconductor material with a plurality of carriers, (c) forming two contact electrodes connected with the resistor structure, and (d) applying a gas sensor layer for covering the resistor structure by sol-gel process.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8501101-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I800751-B
priorityDate 2004-12-24-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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