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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L31-042
filingDate 2006-02-23-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2007-02-11-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b687354f89165bb5c81e59e444645d13
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bc231a1ba8cf8088d94ed450539202ed
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publicationDate 2007-02-11-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber TW-I273721-B
titleOfInvention Method of fabricating silicon quantum dots-sensitized layer of silicon quantum dots-sensitized solar cells
abstract A method of fabricating silicon quantum dots-sensitized layer of silicon quantum dots-sensitized solar cells is disclosed. A substrate comprises an ITO (indium tin oxide) layer stacked up on the TiO2 layer is set in the reactive chamber. Using SiH4 as a precursor, Argon as a dilute or transmitted gas to complete process of forming a silicon quantum dots nucleation, and a growth layer and a surface passivation layer by chemical vapor deposition and multiple pulse to form a silicon quantum dots structure. And then depositing SiCx quantum dots thin film by single pulse to obtain a silicon quantum dots distributed layer on the surface of the titanium dioxide layer. Accordingly, the silicon quantum dots distributed layer can generate electron-hole pairs and limit the motion and direction of the electron by the silicon quantum dots structure to improve the light-electron transforming efficiency.
priorityDate 2006-02-23-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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