http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I272452-B
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_03d0f52bb4069f8a19d70dcfb697c67a |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
| filingDate | 2002-06-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2007-02-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_abf92c6162f276a54a5782dd87f205c1 |
| publicationDate | 2007-02-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-I272452-B |
| titleOfInvention | Positive resist composition |
| abstract | A positive resist composition comprising: (A) a resin capable of increasing the solubility in an alkali developer by the action of acid, in which the resin contains (A1) a repeating unit having at least one of a dihydroxyadamantyl group and a trihydroxyadamantyl group and (A2) a repeating unit containing an acid-decomposable group having an alicyclic structure; and (B) a compound capable of generating an acid upon irradiation with one of an actinic ray and a radiation, wherein the resin (A) contains the repeating unit (A1) and the repeating unit (A2) at a composition molar ratio: A1/A2 of from 0.15 to 1.0, and a total content of the repeating unit (A1) and the repeating unit (A2) in the resin (A) is 40 to 70 mole %. |
| priorityDate | 2001-06-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 301.