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filingDate 2003-07-25-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2007-02-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fb9eb2d9dc3096383d36b370fc8c3db6
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publicationDate 2007-02-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber TW-I272314-B
titleOfInvention Optical antireflection film and process for forming the same
abstract A first SiO film having a refractive index substantially equal to the refractive index of an acrylic resin substrate is formed to a thickness of about 200 nm on the substrate, and a second SiO film having a refractive index assuming a value falling within the range from 1.48 to 1.62 is formed to a thickness of about 200 nm on the first SiO film. Further, in the case of an HLHL type antireflection film, for example, a TiO2 film having a refractive index assuming a value falling within the range from 2.2 to 2.4 is formed as the layer next to the outermost layer with a special ion plating apparatus.
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