http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I271819-B

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assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_38ed56a4b4e8e2315b2b3308bffedb3f
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-823807
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-665
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-78
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-823878
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-7843
filingDate 2005-12-02-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2007-01-21-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_98e5983243ff3a34dc4858050bb940dd
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_30fe9448078e24152f5adaa5ec977003
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_dfd6af2623d6fa87dea494cb14af1ffd
publicationDate 2007-01-21-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber TW-I271819-B
titleOfInvention Improve transistor mobility by adjusting stress in shallow trench isolation
abstract A method of improving transistor carrier mobility by adjusting stress through recessing shallow trench isolation is presented. A trench is formed in a substrate. The trench is filled with a dielectric. A CMOS transistor is formed adjacent to the trench. A silicide layer is formed on the source/drain region, a recess is formed by etching the dielectric so that the surface of the dielectric is substantially lower than the surface of the substrate. Recessing the STI removes the compressive stress applied to the channel region by the STI material. A contact etch stop layer (CESL) is formed over the gate electrode, spacers, source/drain regions and the dielectric. The CESL applies a desired stress to the channel region, trench liners are optionally formed to provide a stress to the channel region, a spacer can optionally be formed in the STI recess.
priorityDate 2004-12-03-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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