http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I267699-B
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_515262dca048e434990a1670088a10fa |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L33-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-023 |
| filingDate | 2000-10-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2006-12-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_57e90726919e1e24213e09cdaf6621a7 |
| publicationDate | 2006-12-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-I267699-B |
| titleOfInvention | Photo-sensitive compositions |
| abstract | The invention relates a photo-sensitive composition made from a photo-resist comprising a resin composition and a photo-sensitive material, wherein said resin compositions comprising a mixture consisting of at least 2 resins having at least 0.03 of the refraction difference, or using an alkali-soluble resin as a resin component of the resin compositions, and the resin additives consisting a resin mixture of acrylic polymers, methacrylic polymer and styrenic polymers, which having a function of inhibiting the solubility of photo-sensitive compositions. The photo-sensitive compositions are preferably having a velocity fro solving in 2.38 by weight of hydroxyl tetra-methyl ammonium being less than 5000 Å/min. By using the said resin compositions, it can obtain a photo-sensitive composition be satisfied with two characteristics of high sensitivity as well as high residue-film property while using a reduced amount of quinonediazide photo-reagents. |
| priorityDate | 1999-10-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 227.