http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I258057-B
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_2707056d594790a62947ee030653e6f8 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08K5-103 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-027 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F299-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K5-103 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate | 2003-09-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2006-07-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8f761bd3183a2faf2e4b1046456a2736 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8074c063aba7c270904f6f653f827bc8 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_06d5d3a2b887e8335b7752c36b819166 |
| publicationDate | 2006-07-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-I258057-B |
| titleOfInvention | Photopolymerizable resin composition for sandblast resist |
| abstract | The present invention relates to a photopolymerizable resin composition for sandblast resist, which comprises, as a photopolymerizable oligomer, a polyalkylene glycol mono(meth)acrylate compound having a terminal alkyl group, a compound selected from polyalkylene glycol di(meth)acrylate compounds, and further a compound selected from urethane compounds having a terminal (meth)acrylate group as derived from a polyether or polyester compound having a terminal hydroxyl group, a diisocyanate compound and a (meth)acrylate compound having a hydroxyl group. The resist containing the photopolymerizable resin composition exhibits much improved reactivity relative to the resist using a urethane compound having a terminal (meth)acrylate group alone or in combination with an unsaturated (meth)acrylate compound, which has been conventionally used for dry films. Particularly, it guarantees remarkable improvement in the damage on the surface of the photopolymerizable resin composition after development for the cured regions, which damage is much serious for the resin composition using a cellulose compound having a carboxyl group as an aqueous alkali-soluble polymer. Consequently, a sandblast resist for realization of high resolution or fabrication of high-resolution PDPs can be provided according to the present invention. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I474918-B |
| priorityDate | 2002-09-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 151.