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classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1409
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filingDate 2003-12-19-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2006-07-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5b2f8e7e8e7ebfb1a34fbe81c474b220
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_57bacdcd413fc56216929cc7d6b67433
publicationDate 2006-07-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber TW-I257422-B
titleOfInvention Polishing composition
abstract A microwaviness reducing agent for polishing a substrate for a precision part, containing either a surfactant having two or more ionic hydrophilic groups, or a polycarboxylic acid compound having 2 to 15 total carbon atoms and having either OH group or groups or SH group or groups, or a salt thereof; a polishing composition for a substrate for a precision part, containing the microwaviness reducing agent, an abrasive and water; a polishing composition comprising water, an abrasive, an organic acid or a salt thereof, and a surfactant, wherein the organic acid is a polycarboxylic acid compound having 2 to 15 total carbon atoms and having either OH group or groups or SH group or groups, and wherein the surfactant has two or more ionic hydrophilic groups in its molecule and has a molecular weight of 300 or more; a method of reducing microwaviness of a substrate for a precision part; and a method for manufacturing a substrate for a precision part.
priorityDate 2002-12-26-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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