http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I255299-B
Outgoing Links
Predicate | Object |
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assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_6bd0cdbc5c67cf4957ed83c89140748e |
classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02F2202-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02F1-3551 |
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C30B33-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C30B29-30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C30B33-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C30B15-00 |
classificationIPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02F1-355 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C30B33-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C30B33-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C30B29-30 |
filingDate | 2004-04-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate | 2006-05-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e45aeba36933509fe19cb1993da9793c http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9225d6477b2900e011cacbb41a9f9bb4 |
publicationDate | 2006-05-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | TW-I255299-B |
titleOfInvention | Lithium tantalate substrate and method of manufacturing same |
abstract | In a lithium tantalate (LT) substrate, sparks are prevented from being generated by the charge up of an electric charge on the substrate surface, and thereby destruction of a comb pattern formed on the substrate surface and breaks or the like in the LT substrate are prevented. Moreover, light passing into the LT substrate during the photolithographic process reflecting back from the rear surface onto the front surface is prevented and the resolution of the comb pattern is prevented from being deteriorated. In a process for manufacturing a LT substrate from a LT crystal, after growing the crystal, a LT substrate in ingot form is imbedded in carbon power, or is place in a carbon vessel, and heat treated is conducted at a maintained temperature of between 650 DEG C and 1650 DEG C for at least 4 hours. |
priorityDate | 2003-04-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 49.