http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I250654-B

Outgoing Links

Predicate Object
assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_3c754156d9ab873a2efe5a3990dbf627
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L29-786
filingDate 2005-07-13-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2006-03-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d7118270e2a0807e411d494d3ac3e58b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_027655b69a99d7dc9edafdd21796228e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e126b054ed5a8507fa72f9a8aabe17b2
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3a77fdef05bf6e1002d01418a75387ad
publicationDate 2006-03-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber TW-I250654-B
titleOfInvention Amorphous silicon thin film transistor with dual gate structures and manufacturing method thereof
abstract An amorphous silicon thin film transistor (a-Si TFT) with dual gate structures and a manufacturing method thereof are provided. The a-Si TFT comprises a substrate, a first gate, an amorphous silicon channel layer, a source, a drain, and a second gate. The first gate is formed on the substrate. The amorphous silicon channel layer is formed above the first gate. The source and the drain are formed above the amorphous silicon channel layer and correspond to the two ends of the first gate. The source and the drain are contacted with the two ends of the amorphous silicon channel layer. The second gate is formed above the source and the drain and corresponds to the first gate. The second gate is electrically connected to the first gate via a contact hole. The peripheral of the second gate overlaps part of that of the source and the drain. Moreover, the a-Si island is completely located inside the first gate.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9054203-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I470806-B
priorityDate 2005-07-13-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

Predicate Subject
isDiscussedBy http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID5352426
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID117625
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419524915
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID57350325
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID454387746
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419559214
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID14806
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID12977495
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID104727
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID414497221
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID162028862
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID71344613
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419559192
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID447817119
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID57347130
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID451817598
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419583196
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID29011
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID447604988
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419523934
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID6326954
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID415818014
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419523132
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID14829

Total number of triples: 40.