http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I240016-B

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assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_6038f17109882ad88e9ba8ea907ebb45
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K3-383
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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-38
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23F1-18
filingDate 2001-07-19-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2005-09-21-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2c71af802d2cd07d531e5557f6765301
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_68c8582229a54d80d1a671c17fecde3f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_432cb5985a3e9d5c2054e6c5d330e9a9
publicationDate 2005-09-21-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber TW-I240016-B
titleOfInvention Micro-etching composition for copper or copper alloy, micro-etching method and method for manufacturing printed circuit board by using the micro-etching composition
abstract The invention provides a micro-etching composition which continuously treat the surface of copper or copper alloys to produce fine microscopic pits for improved adhesion to resins without producing a brown or black deposit, and a micro-etching method and a method for manufacturing printed circuit board by using the micro-etching composition. The micro-etching composition comprises a main ingredient consisting of sulfuric acid and hydrogen peroxide and an assisting ingredient consisting of phenyltetrazole and a chloride ion source. The micro-etching method comprises causing the surface of copper or copper alloy to come into contact with the micro-etching composition, thereby roughening the surface to the etching amount of 0.5-3 mum. The method for manufacturing printed circuit board comprises roughening the surfaces of inner layer circuit patterns by using the micro-etching method.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I398552-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I422711-B
priorityDate 2000-07-28-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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