Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_73ebc284a55d5daf0e209d6186c9e65c |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02F1-133734 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02F2202-09 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02F1-133792 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K2323-021 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02F1-13378 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-5833 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02F1-1337 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-34 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-58 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02F1-1337 |
filingDate |
2004-08-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate |
2005-09-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_65f475edba57c29d144d24aa4bece882 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4544a78ec7291cec8b894632b76e8985 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_594840edf8e0117b2287f30afbd82e76 |
publicationDate |
2005-09-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
TW-I238982-B |
titleOfInvention |
Forming method of inorganic oriented film, inorganic oriented film, substrate for electronic device, liquid crystal panel, and electronic device |
abstract |
An inorganic oriented film with excellent light resistance and with the capability of accurately generating a pre-tilted angle is disclosed. The substrate of the electronic device, the liquid crystal panel, and the electronic device are manufactured with this inorganic oriented film. A method to manufacturing this inorganic oriented film on a substrate is disclosed. On the substrate, the oriented film is formed by an inorganic material by a film depositing process. A milling process is performed by irradiating an ion beam on the film at a specific angel, theta-b, calculated from the normal to the horizontal of the film's surface. By irradiating this ion beam on the film, cavities are formed and the direction of the cavities is at a specific angle. The theta-b is equal or larger than 2 degrees. |
priorityDate |
2003-09-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |