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filingDate 2004-08-27-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2005-09-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_65f475edba57c29d144d24aa4bece882
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publicationDate 2005-09-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber TW-I238982-B
titleOfInvention Forming method of inorganic oriented film, inorganic oriented film, substrate for electronic device, liquid crystal panel, and electronic device
abstract An inorganic oriented film with excellent light resistance and with the capability of accurately generating a pre-tilted angle is disclosed. The substrate of the electronic device, the liquid crystal panel, and the electronic device are manufactured with this inorganic oriented film. A method to manufacturing this inorganic oriented film on a substrate is disclosed. On the substrate, the oriented film is formed by an inorganic material by a film depositing process. A milling process is performed by irradiating an ion beam on the film at a specific angel, theta-b, calculated from the normal to the horizontal of the film's surface. By irradiating this ion beam on the film, cavities are formed and the direction of the cavities is at a specific angle. The theta-b is equal or larger than 2 degrees.
priorityDate 2003-09-02-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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