| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_03d0f52bb4069f8a19d70dcfb697c67a |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0395
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
| filingDate |
2001-07-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2005-08-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b54ae032e6ac34164d2a92ca05e02fc1
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_92c31834d8f2cf218af417d89647356b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_61eb1b5009be47cb05392bb6e31476c3 |
| publicationDate |
2005-08-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-I237162-B |
| titleOfInvention |
Electron radiation- or X ray-resist composition |
| abstract |
The invention provides an positive electron radiation- or X ray-resist composition having high sensitiveness, high resolution, and not only imparting with excellent pattern of rectangular-like profile, but also having excellent stability for PCD, PED and coating property. The positive electron radiation- or X ray-resist composition according the invention, which is characterized in that said composition comprises (a1) compounds being able to generate acid by means of electron radiation or X ray, (b) nitrogen-containing compounds having at least one specific structure in their molecule. |
| priorityDate |
2000-08-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |