| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_2d4ba6b2e50fefcae1a13b759f0f208c |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-322 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-3071
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-3092 |
| classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-32 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03D3-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03D13-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01D61-44
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01D61-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C02F1-469
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C02F1-461
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C02F1-42
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C02F1-44
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C02F9-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01J45-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C02F9-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01J41-04 |
| filingDate |
1999-09-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2005-04-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_133abf3585e3598bc0fdd51daf9e3a18 |
| publicationDate |
2005-04-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-I231292-B |
| titleOfInvention |
Process and equipment for recovering developer from photoresist development waste and reusing it |
| abstract |
A tetraalkylammonium hydroxide (TAAH) solution recovered from a development waste through separation therefrom of impurities such as photoresist is mixed with a surface-active substance to have the surface tension thereof adjusted to a desired one, and then reused as a rejuvenated developer. Thus, the surface-active effect (wetting properties) of the rejuvenated developer recovered from the development waste is properly adjusted and controlled, whereby fine photoresist patterns can be stably and effectively developed. Usable surface-active substances include surfactants, and dissolved photoresist contained in the development waste or a photoresist-containing solution such as a photoresist-containing treated solution derived therefrom. Examples of the method of mixing the recovered TAAH-containing solution with the photoresist-containing solution to prepare the rejuvenated developer include a method wherein the TAAH concentration thereof is adjusted either after or while mixing the two solutions, and a method wherein the TAAH concentrations of the two solutions are respectively adjusted, followed by mixing the two solutions at a proper proportion. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I399359-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I402634-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I399342-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I405050-B |
| priorityDate |
1998-10-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |