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publicationDate 2005-03-21-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber TW-I229916-B
titleOfInvention A substrate processing system and operation method thereof
abstract In a first aspect, a first substrate processing system is provided that include (1) a chamber having a plurality of openings through which a substrate may be transported; (2) a substrate carrier opener coupled to a first one of the plurality of openings; (3) a thermal processing chamber coupled to a second one of the plurality of openings; and (4) a wafer handler contained within the chamber, having a substrate clamping blade and a blade adapted to transport high temperature substrate. Numerous other aspects are provided, as are methods and computer program products in accordance with these and other aspects.
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