| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_eedd2a00c4d0ba56ecf05fb4b97592dd |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-032
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-027 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0007 |
| classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-032
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F2-50
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F2-44
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J9-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J11-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F291-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J11-36
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J11-34 |
| filingDate |
2001-03-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2005-02-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bb72377dddd131d734ec56671d334dd6
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ac60d6180293211b7778093c1cffdd9c |
| publicationDate |
2005-02-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-I228264-B |
| titleOfInvention |
Photocurable paste composition and method forming inorganic calcinated round pattern therefrom |
| abstract |
A photocurable paste composition includes (A) fine inorganic particles, (B) a binder polymer having no ethylenically unsaturated double bonds, (C) one or more photocurable compounds, and (D) a photopolymerization initiator. The composition (B) is preferably dissolved in at least one of the compounds (C). The compounds (C) preferably include a liquid monofunctional photocurable compound having one ethylenically unsaturated double bond per molecule and a polyfunctional photocurable compound having two or more ethylenically unsaturated double bonds per molecule. The composition is advantageously applicable to a method which a trench (recess) part is formed by the application of a specific pattern and an inorganic calcinated pattern, such as a partition wall pattern, an electrode (conductor circuit) pattern, or dielectric (resistor) pattern, to be used in PDPs, FEDs, LCDs, and the like is formed. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-105073790-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I631168-B |
| priorityDate |
2000-03-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |