http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I227507-B
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d80f1040809503e54509c871ba828f75 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-168 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-16 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-38 |
| filingDate | 2001-05-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2005-02-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c675877f14a83fc78ab8b77b195ead0d http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1cb1544882513e4f562a37e04728a566 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_43bc04b01f332232b8752f1105e3e5cc http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ed6b984b95b93494850438edd06ee76a |
| publicationDate | 2005-02-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-I227507-B |
| titleOfInvention | Method and system for coating and developing process |
| abstract | The invented method of coating and developing process is the method of coating and developing process conducted onto the substrate, and is featured with having the followings: the process of providing the coating liquid for the substrate to form the coating film; the process of conducting heat treatment onto the substrate formed with the coating film; the process of cooling the substrate after heat treatment; the process of performing the exposure treatment onto the coating film formed on the substrate; the process of developing the substrate after the exposure treatment; and the process of providing treatment gas to form a protection film on the surface of the coating film after the process of forming the coating film and before conducting the exposing process onto the substrate. According to the present invention, because treatment gas is provided to form a protection film on the surface of the coating film after the process of forming the coating film and before the process of exposing the substrate, it is capable of protecting the substrate from impurities such as oxygen or water vapor in the environment through the protection film. |
| priorityDate | 2000-05-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 30.