http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I227254-B
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fcc0b66123940d1b32783569ebfa2d45 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24B37-205 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-304 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24D7-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08J5-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B32B27-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-24 |
| filingDate | 2002-10-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2005-02-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8382f19a5bb23f13b53ac198ffadc45b http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_55376e1837da0b73561c2a0779c62c21 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4c5d56c6c033d9fd7b104c7056105aba http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_56001f6a1048383fd633d33d2ecd3cc3 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6c7740cff558a2d38ef00192c8f05a98 |
| publicationDate | 2005-02-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-I227254-B |
| titleOfInvention | Window member for chemical mechanical polishing and polishing pad |
| abstract | An object of the present invention is to provide a window member for chemical mechanical polishing, which is excellent in antifouling property and transparency and is excellent in anti-scratching and, further, can easily perform detection of a polishing endpoint of the surface of a semiconductor wafer by passing a light for endpoint detection, in polishing of a semiconductor wafer using an optical endpoint detecting apparatus and also to a polishing pad. A window member 12 (as shown in the figure) for chemical mechanical polishing of the present invention is provided with a substrate part (comprised of polyurethane resin and the like) 12a (as shown in the figure), which is transparent partly at least, an antifouling resin layer 12b (as figure) formed on at least one side of the substrate part. This antifouling resin layer is preferably comprised of a fluoro-polymer having a polysiloxane segment in a main chain. A polishing pad 1 (as figure) may be the one that a window member 12 (as figure) is fitted in a through hole of a substrate for a polishing pad (comprised of polyurethane resin and the like, disc-like, belt-like or the like) 11 (as figure) provided with a through hole penetrating from surface to back, or adhered to a substrate for a polishing pad so as to cover an opening part of the through hole. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I628041-B http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I474893-B http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9126304-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I663020-B http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I663021-B http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I615240-B http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I611866-B |
| priorityDate | 2001-10-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 254.